크롬에칭액(CO-E100)

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Introduction

This product is used to take off undesirable Cr-film on the substrate in the photolithography process.
Cr-etchant is applied to semiconductor. Usage is following.

  • Photo mask’s chrome blank formation
  • Chrome blank formation on LCD color filter
  • Electrode formation on TFT-LCD

Performance

  • Etch time : 95sec.
  • Taper : Upper 80 degree
  • No residues of CrOx
  • Excellent cleanness the surface of substrate

Product list

Code Type Specific gravity Etching Speed Use etc.
CO-E100 HNO3 1.16 ~ 1.18 medium Photo Mask, LCD PCA
(perchloric acid}
CO-E300 P.C.A 1.07 ~ 1.09 fast Photo Mask, Touch
CO-E500 P.C.A + @ 1.05 ~ 1.08 slow Photo Mask

Package and Storage

  • Package : 20 liter PE bottle, 200 liter HDPE drum
  • Storage : Dark and cool place (above 10℃)
  • Expired data : 6 months after manufactured

전자Chemical 사업부

  • 상호명세리오협동조합
  • 연락처054-432-8850